XRD AND XPS INVESTIGATIONS OF THE AlN, AlGaN, GaN LAYERS DEPOSITED ON SILICON BY THE HVPE METHOD

Simion RAEVSCHI, Nicolae SPALATU, Vasile BOTNARIUC, Leonid GORCEAC, Tamara POTLOG, Marius DOBROMIR* Universitatea de Stat din Moldova *Universitatea „Al.I. Cuza” din Iaşi (România)

Аннотация

Using the HVPE (Hydride Vapor Phase Epitaxy) transport method, in system (H2-NH3-HCl-Al-Ga-Si), thin layers of AlN, AlGaN, GaN on silicon substrates were synthesized. Surface morphology as well as transverse sections of structures was investigated by the high resolution SEM (Scanning Electron Microscopy) method. The cross-sectional composition of the structures was studied by the X-Ray Diffraction Method (XRD) and Surface X-Ray (X-Ray Photoelectronic Spectroscopy). Outside of aluminum, gallium and nitrogen in the layers were detected oxygen and carbon. It has been established that the concentration of oxygen on the surface of the GaN layers deposited at relatively lower temperatures is lower. It is assumed that the high concentration of oxygen in the layers takes place after the decomposition of the quartz, from which the reactor is made, at high temperatures. It has been found that the incorporation of gallium into the AlGaN layers is diminished by the flux of aluminum precursors. This demonstrates that the rate of chemical reactions of the nitrogen precursors with the aluminum is significantly higher than with the latter being removed from the deposition area by the transport gas stream. Keywords: GaN, Si, AlN, AlGaN, SEM, XRD, XPS, HVPE.Using the HVPE (Hydride Vapor Phase Epitaxy) transport method, in system (H2-NH3-HCl-Al-Ga-Si), thin layers of AlN, AlGaN, GaN on silicon substrates were synthesized. Surface morphology as well as transverse sections of structures was investigated by the high resolution SEM (Scanning Electron Microscopy) method. The cross-sectional composition of the structures was studied by the X-Ray Diffraction Method (XRD) and Surface X-Ray (X-Ray Photoelectronic Spectroscopy). Outside of aluminum, gallium and nitrogen in the layers were detected oxygen and carbon. It has been established that the concentration of oxygen on the surface of the GaN layers deposited at relatively lower temperatures is lower. It is assumed that the high concentration of oxygen in the layers takes place after the decomposition of the quartz, from which the reactor is made, at high temperatures. It has been found that the incorporation of gallium into the AlGaN layers is diminished by the flux of aluminum precursors. This demonstrates that the rate of chemical reactions of the nitrogen precursors with the aluminum is significantly higher than with the latter being removed from the deposition area by the transport gas stream. Keywords: GaN, Si, AlN, AlGaN, SEM, XRD, XPS, HVPE.%MCEPASTEBIN%